Plasma meets glass

Due to its particular optical and mechanical properties, fused silica is one of the most relevant materials for the production of optical, opto-mechanical and opto-electrical components and systems. Since such glasses feature a high transmittance in the ultraviolet (UV) spectral range, deep UV-laser irradiation or several hybrid methods are usually applied in laser-based manufacturing of optically operative micro-structures on fused silica substrates. Against this background, the development of novel methods for increasing the UV-absorption temporarily is of great interest for laser scribing of optical gratings, micro optics and integrated optical systems. Here, cost- and energy-efficient plasma treatment techniques at atmospheric pressure offer different approaches that can also be applied to other optical glasses.