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Stabilization of high-deposition-rate reactive magnetron sputtering of oxides by in situ spectroscopic ellipsometry and plasma diagnostics
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2000
Journal Article
Title
Stabilization of high-deposition-rate reactive magnetron sputtering of oxides by in situ spectroscopic ellipsometry and plasma diagnostics
Author(s)
Vergöhl, M.
Hunsche, B.
Malkomes, N.
Matthee, T.
Szyszka, B.
Journal
Journal of vacuum science and technology A. Vacuum, surfaces and films
DOI
10.1116/1.582412
Language
English
Fraunhofer-Institut für Schicht- und Oberflächentechnik IST
