Homogeneity of nanoparticle layers as deposited by gas phase condensation and co-deposited with PECVD processes

We report on the bottom-up, in-vacuum synthesis of nanoparticle layers on static substrates with areas of up to 150 × 200 mm2 by gas-phase condensation combined with an additional PECVD source for the deposition of organic (plasma polymer) or inorganic dielectric matrix materials. Nanoparticles embedded in a thin-film matrix have a wide range of potential applications, from antiviral and antibacterial surfaces, to water treatment, (photo-)catalysis, sensing, and structured surfaces for condensation and heat transfer. Ag, Ti, and Pt nanoparticles are obtained from inert gas-phase-condensation (GPC) of sputtered atomic vapor, stemming from an inert gas flow sputtering (GFS) source. This method is suitable for the production of virtually all existing metals. Here, we present the stability and the homogeneity of the resulting nanoparticle layers (Ag- and Pt-NPs). To further inspect the homogeneity of the nanoparticle deposition process, Ag-NPs/SiOx multilayer nanocomposite layers (embedded nanoparticles in a dielectric matrix) are examined by X-ray diffraction. The synthesis/structure/morphology relations are presented for both the initial random deposition (Ag) as well as the highly porous structure (Ti) obtained during later stages of deposition. Nanoparticle size and structures are investigated and the control of nanoparticle size distribution by both pressure in the aggregation zone and discharge power is reported. Specific features of the setup are presented, and allow metal NPs coverage with inhomogeneity values < ± 7% over up to 70 × 70 mm2 area in static mode and 1250 × 70 mm2 in rotation mode.