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Development of boron doping and trench filling processes for a superjunktion based diode
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2003
Diploma Thesis
Titel
Development of boron doping and trench filling processes for a superjunktion based diode
ThesisNote
Kiel, Univ., Dipl.-Arb., 2003
Author(s)
Aloise, G.R.
Verlagsort
Kiel
Language
English
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Fraunhofer-Institut für Siliziumtechnologie ISIT
