English
Deutsch
Log In
Log in with Fraunhofer Smartcard
Password Login
Research Outputs
Fundings & Projects
Researchers
Institutes
Statistics
Fraunhofer-Gesellschaft
Home
Fraunhofer-Gesellschaft
Abschlussarbeit
Development of boron doping and trench filling processes for a superjunktion based diode
Details
Full
Export
Statistics
Options
Show all metadata (technical view)
2003
Diploma Thesis
Title
Development of boron doping and trench filling processes for a superjunktion based diode
Thesis Note
Kiel, Univ., Dipl.-Arb., 2003
Author(s)
Aloise, G.R.
Publishing Place
Kiel
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT