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  4. Spotless arc activated reactive large area EB-PVD of titanium oxide and titanium nitride
 
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2006
Conference Paper
Titel

Spotless arc activated reactive large area EB-PVD of titanium oxide and titanium nitride

Alternative
Mit spotfreiem Lichtbogen aktivierte, großflächige Reaktions-Elektronenstrahlbedampfung von Titanoxid und Titannitrid
Abstract
Plasma activation of EB-PVD (electron beam physical vapor deposition) allows to increase density, hardness, refractive index and other properties of evaporated coatings. This contribution refers to reactive SAD (spotless arc activated deposition) of coatings from the titanium compounds TiO2 and TiN. Electron beam evaporation is combined with the ignition of a spotless arc discharge on the EB heated titanium metal and additional process gas inlet. The process combination has been extended to large area dimensions. Achieved layer properties, coating rates and layer thickness distributions on large substrates will be presented. The technological capacity of reactive large area SAD will be considered with regard to advantageous applications.
Author(s)
Steuer, C.
Von Ardenne Anlagentechnik, Dresden, DE
Reinhold, E.
Von Ardenne Anlagentechnik GmbH, Dresden
Scheffel, B.
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP
Metzner, C.
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP
Hauptwerk
Technology innovation and circular economy. Proceedings of the 2nd Baosteel biennial academic conference 2006. Vol.2
Konferenz
Baosteel Biennial Academic Conference 2006
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Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP
Tags
  • Zerstäuben

  • Sputtern

  • Aufdampfen

  • Plasma-PVD

  • Elektronenstrahlaufdampfen

  • Titanoxid

  • Titannitrid

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