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X-ray texture and residual stress analysis on photoactivated electroless plated Cu-layers
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2000
Conference Paper
Title
X-ray texture and residual stress analysis on photoactivated electroless plated Cu-layers
Author(s)
Kämpfe, A.
Löhe, D.
Stolle, T.
Kämpfe, B.
Mainwork
MicroMat 2000. Proceedings 3rd International Conference and Exhibition Micro Materials
Conference
Micro Materials (Micro Mat) 2000
Language
English
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM