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  4. Application of SiC-X-ray masks for fabrication submicron devices
 
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1988
Conference Paper
Titel

Application of SiC-X-ray masks for fabrication submicron devices

Author(s)
Mackens, U.
Lüthje, H.
Mescheder, U.
Mund, F.
Pongratz, S.
Hauptwerk
Optical/laser microlithography
Konferenz
Symposium on Microlithography 1988
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Language
English
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Fraunhofer-Institut für Siliziumtechnologie ISIT
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