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1998
Journal Article
Title
Selective MOMBE growth of InP-based waveguide/laser butt-joints
Abstract
Selective metal organic molecular beam epitaxy regrowth of InP/GaInAsP passive optical waveguide structures was studied to accomplish butt coupling to an active laser waveguide. Selective deposition of the passive waveguide layer stack around a masked laser mesa was performed at a growth temperature of 485 degrees C. The influence of the native oxide desorption process of the V/III-ratio during growth and of a slight undercut etching was investigated. Uniform waveguide deposition was successfully achieved even at the edges of the laser mesa, specifically in the vicinity of the active layers. The lateral growth rate was reduced to approximately 20% of the vertical rate and enhanced growth near the edge of the mask was completely suppressed. The high quality of the implemented butt-joint was demonstrated on Fabry-Perot lasers comprising an active and a butt coupled passive waveguide section. An increase of the threshold current by only 25% for a 980 mu m long passive section as compared with a laser without a passive section was obtained.
Keyword(s)
chemical beam epitaxial growth
gallium arsenide
gallium compounds
iii-v semiconductors
indium compounds
optical planar waveguides
scanning electron microscopy
semiconductor epitaxial layers
semiconductor growth
waveguide lasers
indium phosphide
passive optical waveguide structure
butt coupling
active laser waveguide
selective deposition
organic molecular beam epitaxy regrowth
oxide desorption
growth temperature
temperature dependence
growth rate
threshold current
photonic integration
sem
485 c
980 micron
InP-GaInAsP