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Copper oxide and copper thin films grown by ALD for seed layer applications
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2008
Conference Paper
Title
Copper oxide and copper thin films grown by ALD for seed layer applications
Author(s)
Wächtler, T.
Schulz, S.E.
Mainwork
Twenty Fifth International VLSI Multilevel Inerconnection Conference (VMIC) 2008. Proceedings
Conference
International VLSI Multilevel Interconnection Conference (VMIC) 2008
Language
English
Fraunhofer-Institut für Elektronische Nanosysteme ENAS
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM
