English
Deutsch
Log In
Log in with Fraunhofer Smartcard
Password Login
Research Outputs
Fundings & Projects
Researchers
Institutes
Statistics
Fraunhofer-Gesellschaft
Home
Fraunhofer-Gesellschaft
Konferenzschrift
Methods and applications of plasmatron high rate sputtering in microelectronics, hybrid microelectronics and electronics
Details
Full
Export
Statistics
Options
Show all metadata (technical view)
1982
Conference Paper
Title
Methods and applications of plasmatron high rate sputtering in microelectronics, hybrid microelectronics and electronics
Author(s)
Schiller, S.
Heisig, U.
Goedicke, K.
Bilz, H.
Steinfelder, K.
Mainwork
Fifth Symposium on Ion Sources and Ion Assisted Technology and International Workshop on Ion Based Techniques for Film Formation 1981. Papers
Conference
Symposium on Ion Sources and Ion Assisted Technology 1981
International Workshop on Ion Based Techniques for Film Formation 1981
DOI
10.1016/0040-6090(82)90190-0
Language
English
Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik FEP
