English
Deutsch
Log In
Log in with Fraunhofer Smartcard
Password Login
Have you forgotten your password?
Research Outputs
Fundings & Projects
Researchers
Institutes
Statistics
Fraunhofer-Gesellschaft
Home
Fraunhofer-Gesellschaft
Artikel
Ion beam exposure of resists.
Details
Full
Export
Statistics
Options
Show all metadata (technical view)
1982
Journal Article
Title
Ion beam exposure of resists.
Other Title
Ionenstrahlbelichtung von Fotolacken
Show more
Author(s)
Ryssel, H.
Prinke, G.
Bernt, H.
Haberger, K.
Hoffmann, K.
Journal
Applied physics. A
Language
English
IFT
Keyword(s)
Fotolack
Fotomaske
Ionenstrahl