2005
Conference Paper
Title

Development of microsystem technologies for a monolithically integrated programmable aperture plates system used in maskless 45nm e-beam lithography tools

Author(s)
Witt, M.
Eichholz, J.
Ratzmann, L.
Kähler, D.
Brünger, W.
Reimer, K.
Döring, H.-J.
Haugeneder, E.
Mainwork
Conference
Language
English