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  4. Application of numerical optimization algorithms used to investigation of thin films in nanoindentation test
 
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2010
Conference Paper
Title

Application of numerical optimization algorithms used to investigation of thin films in nanoindentation test

Abstract
Current developments and trends in microelectronics are focused on thin layers and novel materials. This leads to application of different test and measurement methods, which are capable to measure basic mechanical properties of such materials on micro-scale and nano-scale. This paper focuses on application of the nanoindentation technique. It is one of the most common method for investigating the mechanical material properties (especially thin layers). In order to extract the basic elastic and elasto-plastic mechanical properties the numerical optimization algorithms were used as a support for the tests in combination with the FE-model of the nanoindentation process.
Author(s)
Dowhán, L.
Wymyslowski, A.
Wittler, O.
Mrosko, R.
Mainwork
11th international thermal, mechanical & multi-physics simulation, and experiments in microelectronics and microsystems, EuroSimE 2010  
Conference
International Conference on Thermal, Mechanical & Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems (EuroSimE) 2010  
DOI
10.1109/ESIME.2010.5464549
Language
English
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM  
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