2010
Conference Paper
Title

Laterally graded Mo/Si multilayer for a 5 steradian EUV collector

Abstract
The deposition of laterally graded Mo/Si multilayers for EUV collector optics is one of the key challenges to bring EUV Lithography to high volume manufacturing. Coating results of the world's largest EUV collector are presented.
Author(s)
Perske, M.
Pauer, H.
Yulin, S.
Nesterenko, V.
Schürmann, M.
Feigl, T.
Kaiser, N.
Mainwork
Conference
Language
English