Preparation of soft X-ray monochromators by laser pulse vapour deposition -LPVD-

The paper describes the design of our latest equipment for LPVD of multilayer structures. In detail an UHV-device (base pressure typical 10highminus10 mbar) has been equipped with a new target/substrate manipulator system that allows the deposition of individual layers of good thickness homogeneity. The ablation of the targets is induced by a Nd-YAG-laser (wavelength 1.064 mym, pulse energy 0.9 J, pulse length 7 ns, repetition rate 30 Hz). The deposition process is controlled by an iPC-486 computer i.e. target and substrate are stepper motor driven with reference to quartz oscillator monitoring. Model specimens of Ni/C-layer stacks have been prepared and charaterized by various techniques.