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  4. Developing a process to remove single silicon layers by atomic layer etching
 
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2019
Conference Paper
Title

Developing a process to remove single silicon layers by atomic layer etching

Author(s)
Dittmar, Nils
Küchler, Matthias
Meinecke, Christoph Robert
Reuter, Danny  
Otto, Thomas  
Mainwork
MikroSystemTechnik Kongress 2019  
Conference
MikroSystemTechnik Kongress 2019  
Language
English
Fraunhofer-Institut für Elektronische Nanosysteme ENAS  
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