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Developing a process to remove single silicon layers by atomic layer etching
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2019
Conference Paper
Title
Developing a process to remove single silicon layers by atomic layer etching
Author(s)
Dittmar, Nils
Küchler, Matthias
Meinecke, Christoph Robert
Reuter, Danny
Otto, Thomas
Mainwork
MikroSystemTechnik Kongress 2019
Conference
MikroSystemTechnik Kongress 2019
Language
English
Fraunhofer-Institut für Elektronische Nanosysteme ENAS