• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Silicon nitride, silicon doxide thin insulating films, and other emerging dielectrics VIII
 
  • Details
  • Full
Options
2005
Conference Proceeding
Title

Silicon nitride, silicon doxide thin insulating films, and other emerging dielectrics VIII

Title Supplement
Proceedings of the International Symposium. Proceedings of the Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and other Emerging Dielectrics to be held May 16 - 20, 2005 in Québec City as a part of the 207th meeting of the Electrochemical Society (ECS)
Person Involved
Sah, R.E.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Deen, M.
Zhang, J.F.
Yota, J.
Kamakura, Y.
Publisher
ECS  
Publishing Place
Pennington
Conference
International Symposium on Silicon Nitrid, Silicon Dioxide Thin Insulating Films, and other Emerging Dielectrics 2005  
Electrochemical Society (Meeting) 2005  
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024