English
Deutsch
Log In
Password Login
or
Log in with Fraunhofer Smartcard
Research Outputs
Projects
Researchers
Institutes
Statistics
Fraunhofer-Gesellschaft
Home
Fraunhofer-Gesellschaft
Artikel
Fragmentation in magnetically enhanced reactive ion etching - a LIF and OES study in a CF4 discharge
Details
Full
Export
Statistics
Options
1991
Journal Article
Titel
Fragmentation in magnetically enhanced reactive ion etching - a LIF and OES study in a CF4 discharge
Author(s)
Heinrich, F.
Zeitschrift
Microelectronic engineering
Konferenz
International Conference on Microlithography: Microcircuit Engineering (ME) 1990
DOI
10.1016/0167-9317(91)90127-Y
Language
English
google-scholar
View Details
Fraunhofer-Institut für Siliziumtechnologie ISIT