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Fragmentation in magnetically enhanced reactive ion etching - a LIF and OES study in a CF4 discharge
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1991
Journal Article
Titel
Fragmentation in magnetically enhanced reactive ion etching - a LIF and OES study in a CF4 discharge
Author(s)
Heinrich, F.
Zeitschrift
Microelectronic engineering
Konferenz
International Conference on Microlithography: Microcircuit Engineering (ME) 1990
DOI
10.1016/0167-9317(91)90127-Y
Language
English
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Fraunhofer-Institut für Siliziumtechnologie ISIT
