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Microstructuring of molecularly thin polymer layers by photolithography
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1998
Journal Article
Titel
Microstructuring of molecularly thin polymer layers by photolithography
Author(s)
Prucker, O.
Schimmel, M.
Tovar, G.
Knoll, W.
Rühe, J.
Zeitschrift
Advanced Materials
DOI
10.1002/(SICI)1521-4095(199810)10:14<1073::AID-ADMA1073>3.3.CO;2-4
Language
English
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Fraunhofer-Institut für Grenzflächen- und Bioverfahrenstechnik IGB
