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  4. Electrical characterization of low dose focused ion beam induced damage in silicon by scanning spreading resistance microscopy
 
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2007
Poster
Title

Electrical characterization of low dose focused ion beam induced damage in silicon by scanning spreading resistance microscopy

Title Supplement
Poster at ICN+T 2007, International Conference on Nano Science and Technology 2007, Stockholm, Sweden
Author(s)
Beuer, Susanne  orcid-logo
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Yanev, V.
Rommel, Mathias  orcid-logo
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Bauer, A.J.
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Ryssel, H.
Conference
International Conference on Nano Science and Technology (ICN+T) 2007  
File(s)
Download (1.23 MB)
Rights
Use according to copyright law
DOI
10.24406/publica-fhg-356847
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • FIB induced damage

  • SSRM

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