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Simulation of extreme ultraviolet masks with defective multilayers
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2003
Conference Paper
Title
Simulation of extreme ultraviolet masks with defective multilayers
Author(s)
Evanschitzky, P.
Erdmann, A.
Besacier, M.
Schiavone, P.
Mainwork
Photomask and next-generation lithography mask technology X
Conference
Conference "Photomask Japan" 2003
DOI
10.1117/12.504075
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB
