English
Deutsch
Log In
Password Login
or
Log in with Fraunhofer Smartcard
Research Outputs
Projects
Researchers
Institutes
Statistics
Fraunhofer-Gesellschaft
Home
Fraunhofer-Gesellschaft
Konferenzschrift
Simulation of extreme ultraviolet masks with defective multilayers
Details
Full
Export
Statistics
Options
2003
Conference Paper
Titel
Simulation of extreme ultraviolet masks with defective multilayers
Author(s)
Evanschitzky, P.
Erdmann, A.
Besacier, M.
Schiavone, P.
Hauptwerk
Photomask and next-generation lithography mask technology X
Konferenz
Conference "Photomask Japan" 2003
DOI
10.1117/12.504075
Language
English
google-scholar
View Details
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB
