Identification and removal of opaque defects on X-ray masks in a focussed ion beam repair system
Abstract
Repair experiments to remove opaque defects on silicon X-ray masks withg electroplated gold absorber features were performed using a 100 keV focussed ion beam system. The quality of the milling process was checked by transferring the repaired mask patterns with X-rays into a resist. The influence of the parameters affecting the repair accuracy such as ion image quality, defect localization, redeposition, milling strategy, and microcrystallites in the electroplated gold absorber on X-ray masks are discussed. (IMT)
