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Ion beam sensitivity of polymer resists.
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1981
Journal Article
Titel
Ion beam sensitivity of polymer resists.
Alternative
Ionenstrahlempfindlichkeit von Polymer-Photolacken
Author(s)
Ryssel, H.
Haberger, K.
Kranz, H.
Zeitschrift
Journal of vacuum science and technology
Language
English
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Empfindlichkeit
Ionenstrahl
Lithographie
Photolack
