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  4. Lithographic Patterning and Selective Functionalization of Metal Nanoparticle Composite Films
 
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2020
Journal Article
Titel

Lithographic Patterning and Selective Functionalization of Metal Nanoparticle Composite Films

Abstract
Due to their tunneling-based charge transport mechanism, gold nanoparticle (GNP) composites attract significant interest for applications as resistive sensors for strain and volatile organic compounds. Here, we present a facile method for patterning and re-functionalization of alkanedithiol cross-linked GNP thin films based on deep ultraviolet photolithography. A lift-off process using a sacrificial layer of polymethyl methacrylate (PMMA) was used in combination with a rapid, spin-coating-based GNP film deposition procedure to fabricate patterned GNP films. Furthermore, PMMA mask layers were utilized for selective molecular doping of individual GNP film chemiresistors in a chemiresistor array with different ligand molecules, leading to altered chemical selectivities. The methods presented in this work are suitable for patterning organically cross-linked GNP films for various sensing applications as well as the fabrication of electronic noses based on GNP film chemiresistor arrays. Due to the photolithographic approach, the deposition and re-functionalization methods outlined in this paper are easily scalable, in contrast to serial techniques such as ink-jet printing or microdispensing.
Author(s)
Schlicke, Hendrik
Fraunhofer Center for Applied Nanotechnology CAN, Grindelallee 117, 20146 Hamburg, Germany
Bittinger, Sophia Caroline
Institute of Physical Chemistry, University of Hamburg, Grindelallee 117, 20146 Hamburg, Germany
Vossmeyer, Tobias
Institute of Physical Chemistry, University of Hamburg, Grindelallee 117, 20146 Hamburg, Germany
Zeitschrift
ACS applied electronic materials
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DOI
10.1021/acsaelm.0c00770
Language
English
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Fraunhofer-Institut für Angewandte Polymerforschung IAP
Tags
  • gold nanoparticles

  • composites

  • thin film

  • deposition

  • Chemiresistor

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