• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Artikel
  4. Electron probe microanalysis (EPMA) measurement of thin-film thickness in the nanometre range
 
  • Details
  • Full
Options
2002
Journal Article
Title

Electron probe microanalysis (EPMA) measurement of thin-film thickness in the nanometre range

Abstract
The thickness of thin films of platinum and nickel on fused silica and silicon substrates has been determined by EPMA using the commercial software STRATAGEM for calculation of film thickness. Film thickness ranged in the order 10 nm. An attempt was made to estimate the confidence range of the method by comparison with results from other methods of analysis. The data show that in addition to the uncertainty of the spectral intensity measurement and the complicated fitting routine, systematic deviation caused by the underlying model should be added. The scattering in the results from other methods does not enable specification of a range of uncertainty, but deviations from the real thickness are estimated to be less than 20%.
Author(s)
Procop, M.
Radtke, M.
Krumrey, M.
Hasche, K.
Schädlich, S.
Frank, W.
Journal
Analytical and bioanalytical chemistry  
DOI
10.1007/s00216-002-1514-5
Language
English
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
Keyword(s)
  • electron probe microanalysis

  • EPMA

  • thin film

  • thickness measurement

  • x-ray

  • mechanische Schicht-Charakterisierung

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024