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  4. Controlling the Mg doping profile in MOVPE-grown GaN/Al(0.2)Ga(0.8)N light-emitting diodes
 
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2011
Journal Article
Title

Controlling the Mg doping profile in MOVPE-grown GaN/Al(0.2)Ga(0.8)N light-emitting diodes

Abstract
The Mg back-diffusion in GaN and Al(0.2)Ga(0.8)N is investigated by secondary ion mass spectrometry (SIMS) on simple test samples as well as complete GaN/AlGaN light-emitting diode (LED) structures for emission wavelengths around 350 nm. The diffusion coefficient in Al(0.2)Ga(0.8)N is shown to be increased by 75 % compared to GaN. In the LED structures, the GaN quantum well acts as a diffusion barrier, which cannot be explained solely by the observed increased Mg diffusion in AlGaN. However, this self-limiting behavior can be exploited to control the Mg doping profile in close proximity to the quantum well active region and hence to optimize the optical output of the LEDs.
Author(s)
Gutt, R.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Köhler, Klaus  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Wiegert, J.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Kirste, Lutz  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Passow, Thorsten  orcid-logo
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Wagner, J.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Journal
Physica status solidi. C  
Conference
International Workshop on Nitride Semiconductors (IWN) 2010  
DOI
10.1002/pssc.201001039
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • GaN/Al0.2Ga0.8N

  • back-diffusion

  • MG doping profile

  • depth profile

  • MOVPE

  • SIMS

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