Application of organic/inorganic hybrid photopolymer to fabricate ultra-high-density patterned substrate

The UV nano imprinting process is a promising technology to fabricate nano patterns at low cost and high throughput. To adopt the UV nano imprinting process for production of nano patterned substrates for patterned media, the replicated polymer layer must fulfill certain requirements of the patterned media. In this research, a UV nano imprinting process using an organic/inorganic hybrid photopolymer was developed and the replicated ultra-high-density patterned substrate was evaluated. A silicon mold with full track of nano patterns with pattern size of 35 nm diameter, 70 nm pitch was used. The geometrical properties, surface hardness and adhesion property with magnetic layer of the organic/inorganic hybrid photopolymer patterned substrate were analyzed.