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  4. 80 nm InGaAs MOSFET w-band low noise amplifier
 
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2017
Conference Paper
Title

80 nm InGaAs MOSFET w-band low noise amplifier

Abstract
In this paper, an 80 nm InGaAs MOSFET W-band MMIC low noise amplifier (LNA) is presented. The technology uses 4" GaAs substrates with a molecular beam epitaxy (MBE) grown metamorphic buffer to realize the InGaAs/InAlAs device heterostructure. For a 2 × 20 mm gate width transistor a transit frequency fT of 226 GHz was extrapolated. The transistors show a low gm dispersion of only 2 %. A two-stage cascode configuration is used for the W-band LNA circuit, which was processed in MOSFET and HEMT technology for comparison. The MOSFET LNA achieves a linear gain of more than 18 dB in the frequency range from 71 to 103 GHz with an associated noise figure between 3.3 and 4.5 dB. To the best of the authors knowledge, this is the first reported InGaAs MOSFET millimeter-wave MMIC.
Author(s)
Leuther, Arnulf  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Ohlrogge, Matthias
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Czornomaz, Lukas
IBM Zurich Research Laboratory
Merkle, Thomas  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Bernhardt, Frank  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Tessmann, Axel  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Mainwork
IEEE MTT-S International Microwave Symposium, IMS 2017  
Conference
International Microwave Symposium (IMS) 2017  
DOI
10.1109/MWSYM.2017.8058798
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • InGaAs MOSFET

  • W-band

  • low noise amplifier (LNA)

  • noise figure (NF)

  • MMIC

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