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  4. On the potential of delta-doping for AlInAs/GaInAs HEMTs grown by MBE
 
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1993
Journal Article
Title

On the potential of delta-doping for AlInAs/GaInAs HEMTs grown by MBE

Abstract
A theoretical and experimental comparison of homogeneously doped and delta-doped electron supply regions in AlInAs/GaInAs HEMT structures is presented providing optimized design parameters. The electrical material characteristics in dependence of the doping sheet concentration are assessed. Minimization of the HEMT sheet resistivity is attained by variation of the channel/delta-doping plane separation.
Author(s)
Passenberg, W.
Bach, H.-G.
Bottcher, J.
Kunzel, H.
Journal
Journal of Crystal Growth  
Conference
International Conference on Molecular Beam Epitaxy 1992  
DOI
10.1016/0022-0248(93)90718-C
Language
English
Fraunhofer-Institut für Nachrichtentechnik, Heinrich-Hertz-Institut HHI  
Keyword(s)
  • aluminium compounds

  • gallium arsenide

  • high electron mobility transistors

  • iii-v semiconductors

  • indium compounds

  • molecular beam epitaxial growth

  • semiconductor doping

  • semiconductor growth

  • delta -doping

  • hemts

  • mbe

  • design

  • sheet resistivity

  • AlInAs-GaInAs

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