English
Deutsch
Log In
Log in with Fraunhofer Smartcard
Password Login
Have you forgotten your password?
Research Outputs
Fundings & Projects
Researchers
Institutes
Statistics
Fraunhofer-Gesellschaft
Home
Fraunhofer-Gesellschaft
Konferenzschrift
Plasma-assisted atomic layer deposition of alumina at room temperature
Details
Full
Export
Statistics
Options
Show all metadata (technical view)
2012
Poster
Title
Plasma-assisted atomic layer deposition of alumina at room temperature
Title Supplement
Poster at 17th Workshop on Dielectrics in Microelectronics (WoDiM 2012), June 25-27, 2012, Dresden
Show more
Author(s)
Lemberger, Martin
Fromm, Timo
Rommel, Mathias
Bauer, A.J.
Frey, Lothar
Conference
Workshop on Dielectrics in Microelectronics (WoDiM) 2012
DOI
10.24406/publica-fhg-376166
File(s)
001.pdf (4.41 MB)
Show more
Rights
Under Copyright
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB
Keyword(s)
PEALD
ALD
Al2O3
current conduction mechanisms