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2001
Conference Paper
Title
Interconnection Techniques for Ultra Thin ICs and MEMS Elements
Abstract
By advanced wafer thinning technologies integrated circuits with a thickness below 50µm can be fabricated. These very thin chips offer low system height and topography and show enlarged mechanical flexibility, which enables a diverse potential of use possibilities and new applications. However, they require an adjusted assembly and interconnection technology. Different procedures with their advantages and disadvantages are presented and discussed in this paper.