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  4. Interconnection Techniques for Ultra Thin ICs and MEMS Elements
 
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2001
Conference Paper
Title

Interconnection Techniques for Ultra Thin ICs and MEMS Elements

Abstract
By advanced wafer thinning technologies integrated circuits with a thickness below 50µm can be fabricated. These very thin chips offer low system height and topography and show enlarged mechanical flexibility, which enables a diverse potential of use possibilities and new applications. However, they require an adjusted assembly and interconnection technology. Different procedures with their advantages and disadvantages are presented and discussed in this paper.
Author(s)
Feil, M.
Adler, C.
Klink, G.
König, M.
Mainwork
Micro System Technologies 2001  
Conference
International Conference on Micro-, Electro-, Opto-, Mechanical Systems and Components 2001  
Language
English
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM  
Keyword(s)
  • ultra thin IC

  • assembly

  • interconnection

  • isoplanar contact

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