Ablation of PEDOT/PSS with excimer lasers for micro structuring of organic electronic devices

In this paper we present a potentially fast method for high resolution micro structuring of organic electronics via laser patterning. An investigation of the absorption spectrum in the UV/VIS regime of poly (3,4-ethylene dioxythiophene) poly (styrene-sulfonate) (PEDOT/PSS) has shown that UV-laser radiation should be used for optimal laser ablation of the material. Hence, the ablation characteristics of PEDOT/PSS with two different excimer lasers are compared with each other. The optimal fluence for the ablation of the material has been determined. The lasers used in this study are ArF ( = 193 nm) and KrF ( = 248 nm) excimer lasers.