With the technique of laser pulse vapor deposition (LPVD) thin films of dielectric materials, semiconductors, metallic, organic and high Tsubc superconducting materials can be produced. Sufficiently high power densities give rise to intense evaporation and ionization process resulting in a plasma plume and emission of charged and neutral atomic particles and clusters as well as larger droplet-like aggregates. We will discuss the parameters of this process, as there are wavelength of laser light, pulse duration and pulse energy and the structure of various target materials. Changes of the target surface structure during the process will also be considered.
