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  4. Plasma deposited silicon oxide films for controlled permeation of copper as antimicrobial agent
 
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2015
Journal Article
Title

Plasma deposited silicon oxide films for controlled permeation of copper as antimicrobial agent

Abstract
The aim of this study is to test silicon oxide (SiOx) coatings on copper surfaces as permeation barrier for copper ions affecting the release into the surrounding medium. SiOx films have been deposited on copper coated micro-structured titanium samples by means of a plasma jet. Siloxane layers have been formed from hexamethyldisiloxane (HMDSO) and oxygen using different mixing ratios. FT-IR spectroscopy reveal different SiOx layer characteristics depending on the HMDSO:O2 ratio. The permeation and release of copper is mainly determined by structural defects of the SiOx layer promoting pinhole corrosion and leading to enhanced Cu release compared to uncoated samples.
Author(s)
Lehmann, Antje
Leibniz - Insitut für Oberflächenmodifizierung, Leipzig
Rupf, Stefan
Universität des Saarlandes
Schubert, Andreas  
Fraunhofer-Institut für Zelltherapie und Immunologie IZI  
Zylla, Isabella-Maria
Hochschule Osnabrück
Seifert, Hans Jürgen
IAM - AWP, Karlsruhe
Schindler, Axel
Neue Technologien GmbH & Co. KG
Arnold, Thomas
Leibniz - Institut für Oberflächenmodifizierung, Leipzig
Journal
Clinical plasma medicine  
DOI
10.1016/j.cpme.2015.01.001
Language
English
Fraunhofer-Institut für Zelltherapie und Immunologie IZI  
Keyword(s)
  • antimicrobial deposition

  • atmospheric plasma jet

  • copper

  • dental implant

  • peri-implantitis

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