• English
  • Deutsch
  • Log In
    Password Login
    or
  • Research Outputs
  • Projects
  • Researchers
  • Institutes
  • Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Artikel
  4. Plasma deposited silicon oxide films for controlled permeation of copper as antimicrobial agent
 
  • Details
  • Full
Options
2015
Journal Article
Titel

Plasma deposited silicon oxide films for controlled permeation of copper as antimicrobial agent

Abstract
The aim of this study is to test silicon oxide (SiOx) coatings on copper surfaces as permeation barrier for copper ions affecting the release into the surrounding medium. SiOx films have been deposited on copper coated micro-structured titanium samples by means of a plasma jet. Siloxane layers have been formed from hexamethyldisiloxane (HMDSO) and oxygen using different mixing ratios. FT-IR spectroscopy reveal different SiOx layer characteristics depending on the HMDSO:O2 ratio. The permeation and release of copper is mainly determined by structural defects of the SiOx layer promoting pinhole corrosion and leading to enhanced Cu release compared to uncoated samples.
Author(s)
Lehmann, Antje
Leibniz - Insitut für Oberflächenmodifizierung, Leipzig
Rupf, Stefan
Universität des Saarlandes
Schubert, Andreas
Fraunhofer-Institut für Zelltherapie und Immunologie IZI
Zylla, Isabella-Maria
Hochschule Osnabrück
Seifert, Hans Jürgen
IAM - AWP, Karlsruhe
Schindler, Axel
Neue Technologien GmbH & Co. KG
Arnold, Thomas
Leibniz - Institut für Oberflächenmodifizierung, Leipzig
Zeitschrift
Clinical plasma medicine
Thumbnail Image
DOI
10.1016/j.cpme.2015.01.001
Language
English
google-scholar
Fraunhofer-Institut für Zelltherapie und Immunologie IZI
Tags
  • antimicrobial deposition

  • atmospheric plasma jet

  • copper

  • dental implant

  • peri-implantitis

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Send Feedback
© 2022