Development of tolerances for microsystems on the example of plasma deposited surfaces
Abstract
Production processes with accuracies in the range down to the nanometer scale gain growing importance in industry. A crucial requirement for their economical application is capable and controlled processes. These in turn are dependent on suitable measurement devices and strategies. Though measurement devices with the required precision are available, strategies and tolerance systems in the considered dimensions do not exist. In this paper an approach to the development of tolerance systems for microsystems is presented using the example of sputtered copper films and atomic force microscopy.
