Vorrichtung und Verfahren zur Herstellung von Diamantschichten mittels Gasphasenabscheidung

The invention relates to a device (CVD system) for activated chemical vapour deposition of diamond made of hydrocarbons, consisting of a CVD reactor (1), which is connected to the gas oulet of the CVD reactor (1) via the line (3), a line (4) comprising the valve (5), which projects in a gas tank (6), a line (7), which connects the gas tank (6) to a carbon reactor (8) and a line (9) comprising a valve (10), which runs from the carbon reactor (8) to the gas inlet of the CVD reactor (1), whereby the lines (3, 4, 7, 9) and the pump (2) of the gas tank (6) and the carbon reactor (8) form a closed gas circuit.