Gasflusssputterquelle

(B3) Die vorliegende Erfindung betrifft eine Gasflusssputterquelle, die eine Hohlkathode mit einer Eintritts- und Austrittsoeffnung fuer Inertgas aufweist, wobei im Bereich der Austrittsoeffnung der Hohlkathode ein Gehaeuse mit einer Ausnehmung angeordnet ist.

EP 2287884 A2 UPAB: 20110307 NOVELTY - The gas flow sputter source has a hollow cathode (2) with an inlet opening and an outlet opening for inert gas. A housing (7) is attached in the area of the outlet opening at the hollow cathode. The housing has a recess, whose width amounts to 80 percent of the width of the outlet opening. The side of the housing facing the hollow cathode has a curved surface. The housing is made of steel alloys or aluminum. USE - Gas flow sputter source. ADVANTAGE - The gas flow sputter source has a hollow cathode with an inlet opening and an outlet opening for inert gas, where a housing is attached in the area of the outlet opening at the hollow cathode, and hence ensures long-term operation of the gas flow sputter source without impairment of the layer quality, the coating rate and process stability.