Verfahren zum Herstellen einer wasserfreien Siliziumdioxidschicht

In a process for the production of a moistureless silicon dioxide layer starting from a silicate layer, polysiloxane is photoinduced, polymerized and separated, whereupon the polysiloxane layer is converted into a silicate layer. By transforming the the silicate layer by chemical reaction of the water bound in said layer by means of silane, the silicate layer is converted into a moistureless silicon dioxide layer.