Verfahren und Vorrichtung zur Reinigung von Substratoberflaechen

Process for purifying substrate surfaces, comprises contacting the substrate (11) with ozone in aqueous solution. The solution is extensively saturated with ozone under super-pressure. Also claimed is an apparatus for purifying substrate surfaces comprising a closable vessel for contacting the substrate provided with ozone in aqueous solution. This vessel is a pressure vessel (1) operating at a super-pressure of at least 104 Pa, preferably 4 multiply 105 Pa. ADVANTAGE - The process quickly cleans the surfaces of substrates by removing organic materials.