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  4. Palladiumhaltiges Precursormaterial und Verfahren zur Herstellung von metallischen Mikrostrukturen auf dielektrischen Substraten mit einem palladiumhaltigen Precursormaterial
 
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Patent
Title

Palladiumhaltiges Precursormaterial und Verfahren zur Herstellung von metallischen Mikrostrukturen auf dielektrischen Substraten mit einem palladiumhaltigen Precursormaterial

Other Title
Precursor material containing palladium and process for the production of metallic microstructures on dielectric substrates using a precursor material containing palladium
Abstract
The invention relates to a precursor material containing a palladium compound suspended in an organic solvent for the production of metallic microstructures on dielectric substrates according to a fully additive process, whereby at least one additive is contained in the solution used for forming the coating, said additive causing an irreversible photochemical reaction in its self-absorption area.
Inventor(s)
Toepper, M.
Stolle, T.
Krabe, D.
Chmiel, G.
Schammler, G.
Reichl, H.
Link to:
Espacenet
Patent Number
1995-95078136
Publication Date
1996
Language
German
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM  
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