Magnetron-Sputterquelle

The magnetron sputter source is used in HV and UHV coating systems and is primarily employed in the form of a two-ring sputter source for coating large round substrates. The sputter source consisting of a magnet system (7), a cooled target (5) and an anode (6) is designed so that a cooling plate (4) with the target (5) attached to it is arranged on a base plate (1). The anode (6) surrounding the target (5) is attached to the base plate (1). The base plate (1) closes an opening in the recipient vacuum-tight, thus attaching the magnet system (7) on the base plate (1) on the atmosphere side. The connections (9) for the cooling water are routed through the base plate (1) insulated.