Verfahren zum Herstellen eines Bauteils mit einem Hohlraum und Vorrichtung mit einem zur Führung eines Fluids geeigneten Hohlraum

(A1) Die vorliegende Erfindung betrifft ein Verfahren zum Herstellen eines Bauteils (1) mit einem Hohlraum (2), der mindestens einen Zugang und eine zumindest stellenweise metallische, den Hohlraum (2) begrenzende Oberflächenschicht aufweist, wobei zunächst durch Anlegen eines elektromagnetischen Feldes in einem den Hohlraum (2) füllenden Gas ein Plasma erzeugt wird, durch das eine dem Hohlraum (2) zugewandte Oberfläche (5) eines den Hohlraum (2) umgebenden Materials modifiziert wird, wonach diese Oberfläche (5) nasschemisch metallisiert wird. Die Erfindung betrifft ferner eine in dieser Weise herstellbare Vorrichtung mit einem zur Führung eines Fluids geeigneten Hohlraum (2).

DE 102006014317 A1 UPAB: 20080221 NOVELTY - The method for the manufacture of micro-reactor or microfluidic component, comprises producing a plasma by application of alternating electric field in gas that is supplied to a channel/capillary cavity (2), modifying the cavity facing surface (5) of material surrounding the cavity, and metallizing the surface by the principles of wet-chemistry. The cavity has an inlet and a surface layer that is partially metallic. The material surrounding the cavity is a plastic, ceramic or glass. Primary amino groups are produced at the surface by means of the plasma. DETAILED DESCRIPTION - The method for the manufacture of micro-reactor or microfluidic component, comprises producing a plasma by application of alternating electric field in gas that is supplied to a channel/capillary cavity (2), modifying the cavity facing surface (5) of material surrounding the cavity, and metallizing the surface by the principles of wet-chemistry. The cavity has an inlet and a surface layer that is partially metallic. The material surrounding the cavity is a plastic, ceramic or glass. Primary amino groups are produced at the surface by means of the plasma. The alternating electric field is generated through an alternating voltage of a frequency between 10-100 kHz, and/or of amplitude between 100-80 kV. The plasma is generated at atmospheric pressure. After modified by the plasma, the surface is initially impregnated with a first metal and then a second metal is statically deposited on the surface. For the purpose of impregnation, the surface is brought in contact with a liquid that contains the first metal in ionic or colloidal form. After wetting with the liquid, the surface is brought in contact with sodium hypophosphoric acid or another reducing agent. The second metal forms a layer with a thickness between 10 nm and 5 microns. After the static deposition of the second metal on the surface (5), the surface is galvanically coated with another metal layer. The further metal layer has a layer thickness of 100 nm-35 microns. The gas and/or a fluid that is used for the wet-chemical metallizing is/are supplied through an inlet opening to the cavity (2) and discharged from this cavity through a different outlet opening. The cavity has a smallest diameter of 50 microns-3 mm in a cross-sectional segment that is perpendicular to the direction of flow. The metallized surface forms a wall of a heatable channel, an active surface of a device for surface plasma resonance analysis, or a catalyzed surface or a chemically-inert diffusion barrier. USE - Useful for the production of a micro-reactor or microfluidic component (claimed). ADVANTAGE - The method for the manufacture of component is simple and ensures a cost effective method by using a metal for the manufacturing with low cost and -weight.