Verfahren zur Oberflaechenbehandlung von photoempfindlichen Verbindungshalbleitern

A process for the surface treatment of photosensitive compound semiconductors comprises an electrolytic etching operation during which the compound semiconductor acting as the anode and an inert cathode are immersed in a chemically inert high-viscosity solvent. A strong alkaline solution having a pH of more than 10 is added to the solvent. A current of