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Patent
Title
Verfahren und Vorrichtung zur Bestimmung der Emissionsrate mindestens einer Gaskomponente eines Gasgemischs
Other Title
Process and device for the calculation of the emission rate of at least one gas component of a gas mixture
Abstract
The process according to the invention and the device for the calculation of the emission rate (Ns) of a gas component (G1, G2) in a gas mixture (G) consists of an intensity measuring instrument (GSC) for the selective measurement of the spatial intensity distribution (Is(x, y)) of at least one gas component (G1, G2) of the gas mixture (G). A particle analyzer (TAN) is provided for the measurement of the length-integrated particle volume ((n x L)s) of at least one gas component (G1, G2) along the width (L) of the gas flow (G). A first calculation instrument (C1) determines from the spatial intensity distribution (Is(x, y) the flow velocity (v) of the gas mixture (G), a second calculation instrument (C2) determines a geometry factor (G) for the gas component from the gradient of the spatial intensity distribution (Is(x, y) in the radial direction (x) and a third calculation instrument (C3) determines the emission rate (Ns) from the ge ometry factor (G), the flow velocity (V) and the len gth-integrated particle volume ((n x L)s). Through the use of the device and the process, not only the spatial distribution of at least one gas component (G1, G2) in a gas mixture can be evaluated but also dynamic processes.
Inventor(s)
Rippel, H.
Schaefer, K.
Link to:
Patent Number
1993-4324118
Publication Date
1996
Language
German