Reflection-reducing layer producing method for optical element, involves producing nanostructure on surface of paint layer by plasma etching process, and completely curing paint layer by additionally applying UV light or by tempering

Abstract
(A1) Bei einem Verfahren zur Herstellung einer reflexionsmindernden Schicht auf der Oberflaeche eines optisches Elements (1) wird eine UV-haertbare oder thermisch haertbare Lackschicht (2) im fluessigen Zustand auf die Oberflaeche des optischen Elements (1) aufgebracht, die Lackschicht (2) durch Bestrahlung mit UV-Licht oder durch Tempern teilweise verfestigt, nachfolgend eine Nanostruktur (6) an der Oberflaeche der Lackschicht (2) erzeugt, und nach der Erzeugung der Nanostruktur (6) die Lackschicht (2) durch weitere Bestrahlung mit UV-Licht oder durch weiteres Tempern vollstaendig ausgehaertet.

 

WO 2009074146 A2 UPAB: 20090702 NOVELTY - The method involves applying an UV-curable or thermally curable paint layer (2) onto a surface of an optical element (1) in a liquid state. The paint layer is partially solidified by applying UV light or by tempering. A nanostructure (6) is produced on a surface of the paint layer by a plasma etching process. The paint layer is completely cured by additionally applying UV light or by tempering after producing the nanostructure. The paint layer is made of inorganic-organic hybrid polymer or siloxane. A thin layer e.g. oxide layer, nitride layer, fluoride layer, is applied on the paint layer. USE - Method for producing a reflection-reducing layer on a surface of an optical element (claimed). ADVANTAGE - The nanostructure is produced on the surface of the paint layer by the plasma etching process, and the paint layer is completely cured by additionally applying UV light or by tempering after producing the nanostructure, thus providing the reflection-reducing layer with an increased mechanical stability i.e. high hardness, and hence avoiding risk of damaging of the optical element during cleaning of a surface of the optical element.