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Aqueous-base-developable benzocyclobutene (BCB)-based material - An emerging dielectric material for microelectronics

: So, Y.-H.; Stark, E.; Kisting, S.; Scheck, D.; Baranek, K.; Toepper, M.; Baumgartner, T.


Sah, R.E.; Deen, M.J.; Zhang, J.F.; Yota, J.; Kamakura, Y. ; Electrochemical Society -ECS-, Dielectric Science and Technology Division:
Silicon Nitride, Silicon Dioxide and Emerging Dielectrics : Proceedings of the Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films and Emerging Dielectrics, Part of the 211th Meeting of the Electrochemical Society, Chicago, Illinois, May 6-10, 2007
New Jersey: Electrochemical Society, 2007 (ECS transactions 6, 3)
ISBN: 978-1-56677-552-6
International Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and other Emerging Dielectrics <9, 2007, Chicago/Ill.>
Electrochemical Society (Meeting) <211, 2007, Chicago/Ill.>
Fraunhofer IZM ()

A self-priming and photosensitive aqueous-base-developable benzocyclobutene (BCB)-based dielectric material curable in air is described. The polymer is made from divinylsiloxane benzocyclobutene and BCB-acrylic acid. Patterned films have high resolution, and via openings are scum-free without a descum operation. Whether cured in nitrogen or in air, the formulation produces a film with optical, electrical, thermal, and mechanical properties desired for many microelectronic applications, such as packaging applications and a planarization layer or insulation layer in display applications.