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  4. Dielectric microfilter arrays for multispectral measuring devices
 
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1997
Conference Paper
Title

Dielectric microfilter arrays for multispectral measuring devices

Abstract
For specified colour measuring devices miniaturized dielectric filter arrays have been designed and developed. The manufacturing procedure is based on combination of coating- and micropatterning process including the employment of etchstop layers. The spectral properties of basic filter, fabricated as an unpatterned filter blank, have been modified within small areas by Reactive Ion Etching (RIE) a defined number of layers. This way dielectric interference filters with two different spectral characteristics have been arranged edge by edge within a period of 15 mu m. In this paper design and development of two-colour microfilter arrays are described and problems are depicted, arising with the production of multicolour dielectric microfilters. An alternative manufacturing procedure is discussed, making it possible to arrange more than two different interference filters edge by edge.
Author(s)
Frank, M.
Schallenberg, U.
Kaiser, N.
Buss, W.
Mainwork
Miniaturized systems with micro-optics and micromechanics II  
Conference
Conference on Miniaturized Systems with Micro-Optics and Micromechanics 1997  
DOI
10.1117/12.271423
Language
English
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Keyword(s)
  • colour measuring device

  • dielectric filter array

  • etchstop layer

  • micropattern

  • reactive ion etching

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