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Preparation and characterization of ultra-thin cobalt silicide for VLSI applications
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1995
Journal Article
Titel
Preparation and characterization of ultra-thin cobalt silicide for VLSI applications
Author(s)
Kal, S.
Kasko, I.
Ryssel, H.
Zeitschrift
Bulletin of materials science
DOI
10.1007/BF02744838
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Language
English
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