Under CopyrightYanev, V.V.YanevRommel, MathiasMathiasRommelBauer, A.J.A.J.BauerFrey, L.L.Frey2022-03-114.9.20122010https://publica.fraunhofer.de/handle/publica/37048010.24406/publica-fhg-370480enhigh-k dielectric thin filmsscanning probe microscopysilicon compoundssurface roughnesszirconium oxidesilicon oxide670620530Characterization of thickness variations of thin dielectric layers at a nanoscale using Scanning Capacitance Microscopyposter