Erdmann, A.A.ErdmannShao, F.F.ShaoEvanschitzky, P.P.EvanschitzkyFühner, T.T.Fühner2022-03-112022-03-112010https://publica.fraunhofer.de/handle/publica/36764210.1116/1.3497024Rigorous electromagnetic field simulations are applied to investigate phase effects in the light diffraction from masks for advanced optical and extreme ultraviolet lithography. Analogies of these phase effects with wave aberrations of the projection lens and their impact on the lithographic process performance are discussed.en670620530533Mask-topography-induced phase effects and wave aberrations in optical and extreme ultraviolet lithographyconference paper